陳弘穎(Hong-Ying Chen)

  • 職 稱：助理教授

  • 辦公室： 506 (化材館)

  • 聯絡電話：07-3814526 分機 5127

  • 電子郵件：hychen@cc.kuas.edu.tw

  • 網站：

http://www2.kuas.edu.tw/prof/hychen/

  • Assistant Professor of Chemical & Material Engineering, KUAS

  • Office: 506 Chem. & Mater. Building

  • Tel: +886-7-3814526 ext. 5127

  • E-mail: hychen@cc.kuas.edu.tw

  • Website:

http://www2.kuas.edu.tw/prof/hychen/

  現職：

  • 國立高雄應用科技大學化學工程及材料工程系  助理教授

　

  學歷：

  • 國立中興大學 材料工程學 博士

  • 國立中興大學 材料工程學 碩士

  • 國立雲林工專 材料科學與工程學科

　

  經歷：

  • 亞洲大學 生活應用科學學系 助理教授

  • 臺中健康暨管理學院 生活應用科學學系 助理教授

  • 國立清華大學 材料科學與工程學系 博士後研究

  • 國立臺中技術學院 財務管理系 兼任助理教授

　

  研究專長：

  • 表面科學與工程

  • 功能性薄膜材料

  • 氧化與相變化

  • 薄膜機械性質

  Position:

  • Assistant Professor of Chemical & Material Engineering

  Education background:

  • Ph.D., Materials Eng., National Chung Hsing University, Taiwan.

  • Ms., Materials Eng., National Chung Hsing University, Taiwan.

  • Diploma, Materials Sci. & Eng., National Yunlin Institute of Technology, Taiwan.

  Work experience:

  • Assistant Professor of Applied Life Science, Asia University, Taiwan.

  • Assistant Professor of Applied Life Science, Taichung Healthcare & Management University, Taiwan.

  • PostDoc, National Tsing Hua University, Taiwan.

  • Adjunct Assistant Professor, National Taichung Institute of Technology, Taiwan.

  Description of research:

  • Surface science & engineering

  • Functional thin films

  • Oxidation and phase transformation

  • Mechanical properties of thin films

  教授課程：

  大學部 

  • 普通化學

  • 材料熱力學

  • 工程數學

  • 化工材料

  研究所 

  • 電子顯微鏡

  Teaching:

  - Undergraduate 

  • General Chemistry

  • Thermodynamics of Materials

  • Advanced Engineering Mathematics

  • Chemical Materials

 - Graduate 

  • Electron Microscopy

Selected publications:

  • H.-Y. Chen and F.-H. Lu, "Oxidation Behavior of Chromium Nitride Films," Thin Solid Films, (In press, 2006).

  • H.-Y. Chen, S. Han, and H.-C. Shih, "Argon Ion Beam Voltages Influence the Microstructure of Aluminum Nitride Films in a Dual Ion Beam Sputtering System," Nuclear Inst. Methods in Physics Research B, 242 (2006) 396-398.

  • H.-Y. Chen, S. Han, and H.-C. Shih, “The characterization of aluminum nitride thin films prepared by dual ion beam sputtering,” Surf. Coat. Technol., 200 (2006) 3326-3329.

  • H.-Y. Chen and F.-H. Lu, “Oxidation behavior of titanium nitride films,” J. Vac. Sci. Technol. A, 23 (2005) 1006-1009.

  • H.-Y. Chen, S. Han, and H.-C. Shih, "Microstructures and properties changes induced by a metal vapor vacuum arc chromium-interlayer in chromium nitride films," Materials Letters 58 (2004) 2924-2926.

  • H.-Y. Chen, S. Han, C.-H. Cheng, and H.C. Shih, "Effect of Argon Ion Beam Voltages on the Microstructure of Aluminum Nitride Films Prepared at Room Temperature by a Dual Ion Beam Sputtering System," Applied. Surf. Sci. 228 (2004) 128-133.

  • H.-Y. Chen, C.-J. Tsai, and F.-H. Lu, "The Young's Modulus of Chromium Nitride Films," Surf. Coat. Technol. 184 (2004) 69-73.

  • H.-Y. Chen and Fu-Hsing Lu, "Stress Relaxation-Induced Phase Transformation in Chromium Nitride Films," J. Mater. Sci. Lett., 22 (2003) 817-819.

  • H.-Y. Chen and F.-H. Lu, "Phase Transformation in Chromium Nitride Films," J. Vac. Sci. Technol. A, 21 (2003) 695-700.

最後更新日期：2006年9月26日